Title:
EXTREME ULTRAVIOLET LIGHT GENERATION SYSTEM AND EXTREME ULTRAVIOLET GENERATION APPARATUS
Document Type and Number:
WIPO Patent Application WO/2014/098181
Kind Code:
A1
Abstract:
This extreme ultraviolet light generation system may include a light-focusing optical system configured in such a manner that pre-pulse laser light and main pulse laser light are focused in a plasma generation region; and in such a manner that the optical path axis of the pre-pulse laser light and the optical path axis of the main pulse laser light pass through the plasma generation region at an angle less than or equal to the angle of a loss cone relative to the center axis of a magnetic field generated by a magnetic field generator. A first laser device and a second laser device may be controlled in such a manner that, after irradiating a target outputted from a target generation unit with the pre-pulse laser light in the plasma generation region, the target is irradiated with the main pulse laser light within a delay time ranging from 0.5 μs to 7 μs.
Inventors:
NAGAI SHINJI (JP)
SAITO TAKASHI (JP)
SAITO TAKASHI (JP)
Application Number:
PCT/JP2013/084082
Publication Date:
June 26, 2014
Filing Date:
December 19, 2013
Export Citation:
Assignee:
GIGAPHOTON INC (JP)
International Classes:
H05G2/00
Foreign References:
| JP2009260019A | 2009-11-05 | |||
| JP2012169241A | 2012-09-06 | |||
| JP2012212641A | 2012-11-01 | |||
| JP2011009183A | 2011-01-13 | |||
| JP2010171405A | 2010-08-05 | |||
| JP2010021543A | 2010-01-28 | |||
| JP2012216854A | 2012-11-08 | |||
| JP2012212904A | 2012-11-01 |
Attorney, Agent or Firm:
UTSUNOMIYA Masaaki et al. (JP)
Masaaki Utsunomiya (JP)
Masaaki Utsunomiya (JP)
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