Title:
EXTREME ULTRAVIOLET LIGHT GENERATION SYSTEM AND EXTREME ULTRAVIOLET LIGHT GENERATION METHOD
Document Type and Number:
WIPO Patent Application WO/2016/027346
Kind Code:
A1
Abstract:
This extreme ultraviolet light generation system may be provided with: a chamber; a target supply unit configured to supply a target to a predetermined region in the chamber, said target having an atomic density of 8.0×1017-1.3×1018 atoms/cm3; and a laser device that irradiates the predetermined region with pulsed laser light having an energy density of 10.5-52.3 J/cm2 in the predetermined region.
Inventors:
SUNAHARA ATSUSHI (JP)
SOUMAGNE GEORG (JP)
UENO YOSHIFUMI (JP)
HOSHINO HIDEO (JP)
SOUMAGNE GEORG (JP)
UENO YOSHIFUMI (JP)
HOSHINO HIDEO (JP)
Application Number:
PCT/JP2014/071872
Publication Date:
February 25, 2016
Filing Date:
August 21, 2014
Export Citation:
Assignee:
INST LASER TECHNOLOGY (JP)
GIGAPHOTON INC (JP)
GIGAPHOTON INC (JP)
International Classes:
H05G2/00
Domestic Patent References:
| WO2013180007A1 | 2013-12-05 |
Foreign References:
| JP2009105006A | 2009-05-14 | |||
| JP2010103499A | 2010-05-06 |
Attorney, Agent or Firm:
HOSAKA Nobuhisa et al. (JP)
Hosaka Prolongation of life (JP)
Hosaka Prolongation of life (JP)
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