Title:
EXTREME ULTRAVIOLET LIGHT SOURCE DEVICE
Document Type and Number:
WIPO Patent Application WO/2015/182092
Kind Code:
A1
Abstract:
The present invention discloses an extreme ultraviolet light source device with which efficient EUV radiation can be stably obtained. This EUV light source device (100) is provided with a first laser source (31a) which shines a laser light (L1) on a high-temperature plasma raw material (22a), and a second laser source (31b) which, after the laser light (L1) is shone on the high-temperature plasma raw material (22a) and before effective extreme ultraviolet light is emitted, shines a laser light (L2) on a region of the raw material on which the laser light (L1) has been shone. The EUV light source device (100) is further provided with a return light prevention portion (321) which prevents return light of the laser light (L1) shone by the first laser source (31a) from reaching a light emission opening of the second laser source (31b).
Inventors:
YOKOYAMA TAKUMA (JP)
Application Number:
PCT/JP2015/002593
Publication Date:
December 03, 2015
Filing Date:
May 22, 2015
Export Citation:
Assignee:
USHIO ELECTRIC INC (JP)
International Classes:
H05G2/00
Foreign References:
| JP2011508965A | 2011-03-17 | |||
| JP4623192B2 | 2011-02-02 | |||
| JP2012175006A | 2012-09-10 | |||
| JP2009016488A | 2009-01-22 | |||
| JP2012104861A | 2012-05-31 |
Attorney, Agent or Firm:
KONISHI, Kay et al. (JP)
Megumi Konishi (JP)
Megumi Konishi (JP)
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