Title:
EXTREME UV LIGHT GENERATION DEVICE AND EXTREME UV LIGHT GENERATION SYSTEM
Document Type and Number:
WIPO Patent Application WO/2013/180007
Kind Code:
A1
Abstract:
An extreme UV light generation device, which may be configured so as to generate extreme UV light by beaming laser light onto the target and causing the target to turn into a plasma. The extreme UV light generation device may be provided with: a chamber provided with at least one through-hole; an optical system configured so as to introduce laser light into a predetermined region in the chamber through the through-hole; and a target feed device configured so as to feed a powder target into the predetermined region.
Inventors:
UENO YOSHIFUMI (JP)
WAKABAYASHI OSAMU (JP)
WAKABAYASHI OSAMU (JP)
Application Number:
PCT/JP2013/064364
Publication Date:
December 05, 2013
Filing Date:
May 23, 2013
Export Citation:
Assignee:
GIGAPHOTON INC (JP)
International Classes:
H05G2/00
Foreign References:
| JPH11345698A | 1999-12-14 | |||
| JPH10221499A | 1998-08-21 | |||
| JP2001208673A | 2001-08-03 | |||
| JP2005022886A | 2005-01-27 | |||
| JP2006117527A | 2006-05-11 | |||
| JP2010232150A | 2010-10-14 | |||
| JP2011253818A | 2011-12-15 | |||
| JP2011210704A | 2011-10-20 | |||
| JP2008283107A | 2008-11-20 | |||
| JP2008511110A | 2008-04-10 |
Attorney, Agent or Firm:
UTSUNOMIYA Masaaki et al. (JP)
Masaaki Utsunomiya (JP)
Masaaki Utsunomiya (JP)
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