FABRIC HAVING CUT-LOOP STRUCTURE, MANUFACTURING METHOD THEREFOR, AND PRODUCT USING SAME

Title:

FABRIC HAVING CUT-LOOP STRUCTURE, MANUFACTURING METHOD THEREFOR, AND PRODUCT USING SAME

Document Type and Number:

WIPO Patent Application WO/2017/094932

Kind Code:

A1

Abstract:

The present invention relates to a fabric having a cut-loop structure, and according to the present invention, a fabric having a cut-loop structure is provided, the fabric comprising: a floor fabric having a woven or knitted shape formed by floor yarn; loop yarn formed on at least one surface of the floor fabric by being woven or knitted using yarn; and a cut-loop layer formed by cutting at least one portion of the loop yarn, wherein the yarn is manufactured by positioning, in parallel to each other, at least one first yarn formed of one or two or more fibers, and at least one second yarn formed of one or two or more fibers, then giving an inter by which the first yarn and the second yarn are coupled into one along the length direction, wherein the fiber strength of the fibers of the first yarn and the fiber strength of the fibers of the second yarn are different from each other.

Inventors:

LEE HYUN SAM (KR)
CHOI SUNG HOON (KR)

Application Number:

PCT/KR2015/013099

Publication Date:

June 08, 2017

Filing Date:

December 02, 2015

Export Citation:

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Assignee:

CLEMBON CO LTD (KR)

International Classes:

D03D11/00; D03D1/00; D03D13/00; D03D15/00

Foreign References:

KR101326213B1	2013-11-11
KR100737976B1	2007-07-13
KR100716623B1	2007-05-09
KR101258053B1	2013-04-24
KR940014988A	1994-07-19
KR20150136365A	2015-12-07
KR100929510B1	2009-12-03
KR100716623B1	2007-05-09

Other References: