FABRIC WIPER HAVING LITMUS FUNCTION AND METHOD FOR MANUFACTURING SAME

WIPO Patent Application WO/2015/034266

A1

The present invention relates to a fabric wiper having a litmus function and a method for manufacturing the same and, more particularly, the method comprises: a fabric manufacturing step of manufacturing a fabric by weaving a fiber; a litmus solution manufacturing step of grinding litmus granules, dissolving the granules in a solvent, and centrifuging a supernatant while heating the granules, thereby manufacturing a litmus solution; a litmus solution applying step of applying the litmus solution to a surface of the fabric; a first drying step of drying the fabric, which has undergone the litmus solution applying step; an antistatic agent applying step of applying an antistatic agent to a surface of the fabric, which has undergone the first drying step; and a second drying step of drying the fabric, which has undergone the antistatic agent applying step. A fabric wiper having a litmus function, which is manufactured through the above process, is obtained by endowing a fabric wiper, which is used when a chemical leaks during a semiconductor manufacturing process or a chemical treating process, with a litmus function such that it can be recognized whether the fabric wiper has been used or not during a chemical leak, thereby preventing accidents, such as fires, heating, and explosions, caused by reactions between chemicals applied on the used wiper.

LEE BYUNG CHIL (KR)

PCT/KR2014/008278

March 12, 2015

September 03, 2014

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LEE BYUNG CHIL (KR)

D06M15/00; D06M101/06; D06M101/32

JP2011107141A	2011-06-02
JP2009120768A	2009-06-04

TAEDONG PATENT & LAW FIRM (KR)
특허법인 태동 (KR)

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