Title:
FABRICATION METHOD FOR TFT ARRAY SUBSTRATE AND FABRICATION METHOD FOR DISPLAY DEVICE
Document Type and Number:
WIPO Patent Application WO/2019/109445
Kind Code:
A1
Abstract:
A fabrication method for an array substrate and display device, comprising: forming a water-soluble organic substance layer (103) on a surface of a passivation layer (102); forming a photoresist layer on a surface of the water-soluble organic substance layer (103); performing yellow light engineering to obtain a photoresist layer pattern and a water-soluble organic substance layer pattern, wherein a cross section of a water-soluble organic substance layer region (103a) is smaller than a cross section of the bottom surface of a photoresist region (104); dry etching the passivation layer (102) such that a cross section of a passivation layer pattern is the same as a cross section of the water-soluble organic substance layer pattern.
Inventors:
OU TIAN (CN)
JIANG ZHIXIONG (CN)
JIANG ZHIXIONG (CN)
Application Number:
PCT/CN2018/071273
Publication Date:
June 13, 2019
Filing Date:
January 04, 2018
Export Citation:
Assignee:
SHENZHEN CHINA STAR OPTOELECTRONICS SEMICONDUCTOR DISPLAY TECH CO LTD (CN)
International Classes:
H01L27/12
Foreign References:
| CN104867942A | 2015-08-26 | |||
| CN104952792A | 2015-09-30 | |||
| CN106129063A | 2016-11-16 | |||
| CN106298646A | 2017-01-04 | |||
| CN106783876A | 2017-05-31 | |||
| US20140295626A1 | 2014-10-02 |
Attorney, Agent or Firm:
ESSEN PATENT & TRADEMARK AGENCY (CN)
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