FACE MASK STRUCTURE - LIN CHIA-CHI

Title:

FACE MASK STRUCTURE

Document Type and Number:

WIPO Patent Application WO/2016/197942

Kind Code:

A1

Abstract:

Disclosed is a face mask structure, which comprises a first face mask body (10), a main filter layer (11), a stopper (12) and a second face mask body (13), wherein the main filter layer (11) is provided in the first face mask body (10), and the area of the main filter layer (11) is smaller than that of the first face mask body (10). The stopper (12) is provided in the first face mask body (10) and is adjacent to the periphery of the main filter layer (11). The second face mask body (13) covers the main filter layer (11) and the stopper (12), and is joined with the stopper (12) and the first face mask body (10), so that the joint of the face mask structure can be completely sealed, and a filter material (for example, a sterilization material or an adsorbing material) of the main filter layer (11) will not leak from the joint. In addition, the stopper (12) can guide the air inside and outside the face mask structure to only pass through the main filter layer so as to prevent contaminant particles, bacteria or viruses inside and outside the face mask structure from being inhaled by a user or spreading to the outside air.

Inventors:

LIN CHIA-CHI (CN)

Application Number:

PCT/CN2016/085255

Publication Date:

December 15, 2016

Filing Date:

June 08, 2016

Export Citation:

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Assignee:

LIN CHIA-CHI (CN)

International Classes:

A41D13/11; A62B9/06

Domestic Patent References:

WO2002085426A2

2002-10-31

Foreign References:

CN203015893U	2013-06-26
CN201248380Y	2009-06-03
CN201119436Y	2008-09-24
CN200995002Y	2007-12-26
US20100313890A1	2010-12-16
CN104623824A	2015-05-20

Other References: