FACILITY FOR TREATMENT OF GAS IN TUNNEL

WIPO Patent Application WO/2012/011393

A1

A facility for treating a gas in a tunnel, comprising a duct (11) which enables the communication between the inside and the outside of the tunnel and can allow a gas (1) in the tunnel to flow to the outside, an electrical dust precipitator (12) which is arranged in the duct (11), a nitrogen dioxide absorbent (13) which is placed in the duct (11) on the side of downstream of the flow of the gas (1) relative to the electrical dust precipitator (12), an air-permeable fine filter (15) which is arranged between the electrical dust precipitator (12) and the nitrogen dioxide absorbent (13) in the duct (11) and can trap only particles having particle diameters of less than 20 μm, and an air-permeable coarse filter (14) which is arranged between the fine filter (15) and the electrical dust precipitator (12) in the duct (11) and can trap particles having particle diameters of 20 μm or more.

YONEMURA Masanao (16-5, Konan 2-chome, Minato-k, Tokyo 15, 〒1088215, JP)
米村　将直 (〒15 東京都港区港南二丁目１６番５号　三菱重工業株式会社内 Tokyo, 〒1088215, JP)

JP2011/065534

January 26, 2012

July 07, 2011

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MITSUBISHI HEAVY INDUSTRIES MECHATRONICS SYSTEMS, LTD. (1-16, Komatudoori 5-chomeHyogo-ku,Kobe-sh, Hyogo 65, 〒6520865, JP)
三菱重工メカトロシステムズ株式会社 (〒65 兵庫県神戸市兵庫区小松通５丁目１番１６号 Hyogo, 〒6520865, JP)
YONEMURA Masanao (16-5, Konan 2-chome, Minato-k, Tokyo 15, 〒1088215, JP)

B01D53/56; B01D53/81; B03C3/02; B03C3/155

MITSUISHI Toshiro et al. (Mitsuishi Law and Patent Office, 9-15 Akasaka 1-chome, Minato-k, Tokyo 52, 〒1070052, JP)

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