Title:
FACILITY FOR TREATMENT OF GAS IN TUNNEL
Document Type and Number:
WIPO Patent Application WO/2012/011393
Kind Code:
A1
Abstract:
A facility for treating a gas in a tunnel, comprising a duct (11) which enables the communication between the inside and the outside of the tunnel and can allow a gas (1) in the tunnel to flow to the outside, an electrical dust precipitator (12) which is arranged in the duct (11), a nitrogen dioxide absorbent (13) which is placed in the duct (11) on the side of downstream of the flow of the gas (1) relative to the electrical dust precipitator (12), an air-permeable fine filter (15) which is arranged between the electrical dust precipitator (12) and the nitrogen dioxide absorbent (13) in the duct (11) and can trap only particles having particle diameters of less than 20 μm, and an air-permeable coarse filter (14) which is arranged between the fine filter (15) and the electrical dust precipitator (12) in the duct (11) and can trap particles having particle diameters of 20 μm or more.
Inventors:
YONEMURA MASANAO (JP)
SUGISAKI HISANORI (JP)
SUGISAKI HISANORI (JP)
Application Number:
PCT/JP2011/065534
Publication Date:
January 26, 2012
Filing Date:
July 07, 2011
Export Citation:
Assignee:
MITSUBISHI HEAVY IND MECHATRONICS SYSTEMS LTD (JP)
YONEMURA MASANAO (JP)
SUGISAKI HISANORI (JP)
YONEMURA MASANAO (JP)
SUGISAKI HISANORI (JP)
International Classes:
B01D53/56; B01D53/81; B03C3/02; B03C3/155
Foreign References:
| JPH05123533A | 1993-05-21 | |||
| JP2009240973A | 2009-10-22 | |||
| JPH09239238A | 1997-09-16 | |||
| JP2009285592A | 2009-12-10 | |||
| JPH04358550A | 1992-12-11 |
Attorney, Agent or Firm:
MITSUISHI Toshiro et al. (JP)
Toshiro Mitsuishi (JP)
Toshiro Mitsuishi (JP)
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Claims:
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