Title:
FALSE EYELASH BASE
Document Type and Number:
WIPO Patent Application WO/2012/014880
Kind Code:
A1
Abstract:
Provided is a false eyelash base which can be easily worn and is free from slipping or falling off during wearing. In the base which has an extremely small thickness, a margin (2a) is formed in the lower end part of the surface along the longitudinal direction and margins (2b) are formed at both sides of the base adjacent to an adhesive layer (4). In the bottom part of the base excluding the margins, the adhesive layer (4), to which a number of hair materials (3) are to be adhered, is formed and a sticky layer (7) is formed on the entire back face thereof. The lower end part of the base has a linear shape while the upper end part thereof has an upward curved shape. The base is cut by irradiating the back face of the base with laser light (R). In producing false eyelashes by cutting the base into a definite shape with the laser light, the margin provided on the lower end surface protects a part of the adhesive layer, to which the hair materials are to be adhered, from breakage or damage. Thus, the sticky layer never falls off from the base and, therefore, separation of the base from the eyelid and falling off of the hair materials from the base can be both prevented.
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Inventors:
HOCHI Hiroshi (4-3, Nishi-shinjuku 7-chome, Shinjuku-k, Tokyo 23, 〒1600023, JP)
Application Number:
JP2011/066943
Publication Date:
February 02, 2012
Filing Date:
July 26, 2011
Export Citation:
Assignee:
Propia Co., Ltd. (4-3 Nishi-shinjuku 7-chome, Shinjuku-ku Tokyo, 23, 〒1600023, JP)
株式会社プロピア (〒23 東京都新宿区西新宿七丁目４番３号 Tokyo, 〒1600023, JP)
株式会社プロピア (〒23 東京都新宿区西新宿七丁目４番３号 Tokyo, 〒1600023, JP)
International Classes:
A41G5/02
Attorney, Agent or Firm:
ASANO Katsumi (Akasaka Nanabankan Rm204, 6-41 Akasaka 7-chome, Minato-k, Tokyo 52, 〒1070052, JP)
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Claims: