Title:
Fe-Co-BASED ALLOY SPUTTERING TARGET MATERIAL, SOFT MAGNETIC THIN FILM LAYER, AND VERTICAL MAGNETIC RECORDING MEDIUM PRODUCED USING SAID SOFT MAGNETIC THIN FILM LAYER
Document Type and Number:
WIPO Patent Application WO/2015/022963
Kind Code:
A1
Abstract:
A sputtering target material comprising a Fe-Co-based alloy which comprises at least one M element selected from Nb, Ta, Mo and W, Fe and/or Co and a remainder made up by unavoidable impurities, and which satisfies formula (1): (FeX-Co100-X)100-YMY [wherein the atomic ratios are as follows: 0 ≤ X ≤ 100 and 4 ≤ Y ≤ 28], wherein the microstructure of the sputtering target material has phases each mainly composed of Fe and Co and an intermetallic compound phase composed of Fe and/or Co and a M element, the phases each mainly composed of Fe and Co are surrounded, split and isolated by growing the intermetallic compound phase composed of Fe and/or Co and the M element in a net-like shape, and the number of the phases each mainly composed of Fe and Co which are isolated by the intermetallic compound phase is 300 or more per 10000 μm2 in the sputtering target material.
Inventors:
HASEGAWA HIROYUKI (JP)
SAWADA TOSHIYUKI (JP)
MATSUBARA NORIAKI (JP)
SAWADA TOSHIYUKI (JP)
MATSUBARA NORIAKI (JP)
Application Number:
PCT/JP2014/071305
Publication Date:
February 19, 2015
Filing Date:
August 12, 2014
Export Citation:
Assignee:
SANYO SPECIAL STEEL CO LTD (JP)
International Classes:
C23C14/34; C22C19/07; C22C38/00; G11B5/667; G11B5/851; C22C1/04; C22C33/02
Foreign References:
| JP2008127588A | 2008-06-05 | |||
| JP2008121071A | 2008-05-29 | |||
| JP2010024548A | 2010-02-04 |
Attorney, Agent or Firm:
KATSUNUMA Hirohito et al. (JP)
Katsunuma Hirohito (JP)
Katsunuma Hirohito (JP)
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