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Title:
Fe-Pt-BASED SPUTTERING TARGET IN WHICH C PARTICLES ARE DISPERSED
Document Type and Number:
WIPO Patent Application WO/2013/094605
Kind Code:
A1
Abstract:
A sputtering target for magnetic recording films, which is characterized by containing from 5 mol% to 60 mol% (inclusive) of Pt, from 0.1 mol% to 40 mol% (inclusive) of C and from 0.05 mol% to 20 mol% (inclusive) of titanium oxide, with the balance made up of Fe. The present invention addresses the problem of providing a high-density sputtering target which enables the formation of a magnetic thin film having a granular structure without using an expensive co-sputtering system, while reducing the amount of particles generated during the sputtering.

Inventors:
OGINO SHIN-ICHI (JP)
SATO ATSUSHI (JP)
NAKAMURA YUICHIRO (JP)
Application Number:
PCT/JP2012/082795
Publication Date:
June 27, 2013
Filing Date:
December 18, 2012
Export Citation:
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Assignee:
JX NIPPON MINING & METALS CORP (JP)
International Classes:
C23C14/34; C22C5/04; C22C32/00; C22C33/02; C22C38/00; B22F3/10; B22F3/14
Foreign References:
JP2010129163A2010-06-10
JP2011154746A2011-08-11
JP2003313659A2003-11-06
JP2011208167A2011-10-20
Other References:
J.S.CHEN ET AL.: "Granular Llo FePt-X (X=C, Ti02, Ta205) (001) nanocomposite films with small grain size for high density magnetic recording", JOURNAL OF APPLIED PHYSICS, vol. 105, pages 07B702 - 1 - 07B702-3
Y.F.DING ET AL.: "Granular L10 FePt:Ti02 (001) nanocomposite thin films with 5nm grains for high density magnetic recording", APPLIED PHYSICS LETTERS, vol. 93, 2008, pages 032506 - 1 - 032506-3
Attorney, Agent or Firm:
OGOSHI Isamu et al. (JP)
Isamu Ogoshi (JP)
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Claims: