Title:
FERROELECTRIC THIN-FILM LAMINATE SUBSTRATE, FERROELECTRIC THIN-FILM ELEMENT, AND MANUFACTURING METHOD OF FERROELECTRIC THIN-FILM LAMINATE SUBSTRATE
Document Type and Number:
WIPO Patent Application WO/2016/152419
Kind Code:
A1
Abstract:
The purpose of the present invention is to provide a niobic acid-based ferroelectric thin-film laminate substrate which can reduce costs while maintaining performance and characteristics as a thin-film element, and to provide a ferroelectric thin-film element cut out from said laminate substrate. This ferroelectric thin-film laminate substrate comprises, laminated in order on a substrate, a lower electrode layer, a ferroelectric thin-film layer, an upper electrode intermediate layer and an upper electrode layer, and is characterized in that the lower electrode layer comprises Pt or a Pt alloy, the ferroelectric thin-film layer comprises (K1-xNax)NbO3 (0.4 ≦ x ≦ 0.7), the upper electrode layer comprises Al or an Al alloy, the upper electrode intermediate layer comprises a metal which is less prone to oxidation than Ti and which can produce an intermetallic compound with Al, and part of the upper electrode intermediate layer and part of the upper electrode layer are alloyed.
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Inventors:
HORIKIRI FUMIMASA (JP)
SHIBATA KENJI (JP)
WATANABE KAZUTOSHI (JP)
SUENAGA KAZUFUMI (JP)
ENDO HIROYUKI (JP)
SHIBATA KENJI (JP)
WATANABE KAZUTOSHI (JP)
SUENAGA KAZUFUMI (JP)
ENDO HIROYUKI (JP)
Application Number:
PCT/JP2016/056420
Publication Date:
September 29, 2016
Filing Date:
March 02, 2016
Export Citation:
Assignee:
SUMITOMO CHEMICAL CO (JP)
International Classes:
H01L41/047; C01G33/00; H01L21/8246; H01L27/105; H01L37/02; H01L41/187; H01L41/29
Foreign References:
| JP2011192736A | 2011-09-29 | |||
| JP2015053417A | 2015-03-19 | |||
| JP2013225608A | 2013-10-31 |
Other References:
See also references of EP 3276686A4
Attorney, Agent or Firm:
POLAIRE I. P. C. (JP)
Polaire Intellectual Property Corporation (JP)
Polaire Intellectual Property Corporation (JP)
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