FERROMAGNETIC MATERIAL SPUTTERING TARGET - JX NIPPON MINING & METALS CORP

Title:

FERROMAGNETIC MATERIAL SPUTTERING TARGET

Document Type and Number:

WIPO Patent Application WO/2012/081668

Kind Code:

A1

Abstract:

Provided is a ferromagnetic material sputtering target that: is a sputtering target comprising a metal with a composition including Cr at 20 mol% max., Ru at 0.5-30 mol%, and Co as the remainder; and is characterized by the target structure having a metal matrix (A) and a Co-Ru alloy phase (B) in the metal matrix (A) that contains 35 mol% or more Ru. A ferromagnetic material sputtering target capable of improving leakage magnetic flux and stable discharge with a magnetron sputtering device is obtained.

Inventors:

ARAKAWA ATSUTOSHI (JP)
IKEDA YUKI (JP)

Application Number:

PCT/JP2011/079056

Publication Date:

June 21, 2012

Filing Date:

December 15, 2011

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Assignee:

JX NIPPON MINING & METALS CORP (JP)
ARAKAWA ATSUTOSHI (JP)
IKEDA YUKI (JP)

International Classes:

C23C14/34; C23C14/06; C23C14/14; G11B5/851; H01F10/16; H01F41/18

Domestic Patent References:

WO2009014205A1

2009-01-29

Foreign References:

JPH08180360A	1996-07-12
JP2005251375A	2005-09-15

Attorney, Agent or Firm:

OGOSHI ISAMU (JP)
Isamu Ogoshi (JP)

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