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Patent Searching and Data


Title:
FIELD EMISSION DEVICE AND REFORMING TREATMENT METHOD
Document Type and Number:
WIPO Patent Application WO/2017/221478
Kind Code:
A1
Abstract:
An emitter (3) and a target (7) are arranged oppositely in a vacuum chamber (1), and a guard electrode (5) is provided on the outer peripheral side of the electron generating unit (31) of the emitter (3). An emitter support unit (4), which comprises a moving body (40) which can move freely towards both ends of the vacuum chamber (1), supports the emitter (3) movably towards both ends. Reforming treatment of the guard electrode (5) involves operating the emitter support unit (4) and moving the emitter (3) to a non-discharge position to bring about a state in which field emission of the electron generating unit (31) is suppressed, and then applying a voltage to the guard electrode (5) and repeatedly discharging. After the reforming treatment, the emitter support unit (4) is again operated, the emitter (3) is moved into the discharge position, and, in a state in which a movement restriction unit (6) restricts movement of the moving body (40) towards the other end of the vacuum chamber (1), a state is brought about in which field emission of the electron generating unit (31) is possible.

Inventors:
TAKAHASHI, Daizo (1-1 Osaki 2-chome, Shinagawa-k, Tokyo 29, 〒1416029, JP)
HATANAKA, Michihiro (1-1 Osaki 2-chome, Shinagawa-k, Tokyo 29, 〒1416029, JP)
Application Number:
JP2017/010550
Publication Date:
December 28, 2017
Filing Date:
March 16, 2017
Export Citation:
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Assignee:
MEIDENSHA CORPORATION (1-1 Osaki 2-chome, Shinagawa-ku Tokyo, 29, 〒1416029, JP)
International Classes:
H01J35/06; H05G1/00
Attorney, Agent or Firm:
KOBAYASHI, Hiromichi et al. (Ekisaikai Bldg. 1-29, Akashi-cho, Chuo-k, Tokyo 44, 〒1040044, JP)
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