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Patent Searching and Data


Title:
FIELD EMISSION-TYPE ELECTRON SOURCE AND CHARGED PARTICLE BEAM DEVICE
Document Type and Number:
WIPO Patent Application WO/2019/008738
Kind Code:
A1
Abstract:
Provided are: a field emission-type electron source with which the influence of an electric field can be suppressed and stable long-term emission characteristics can be obtained even when a diffusion supply source is disposed close to the tip of a needle-like electrode; and a charged particle beam device using the same. According to the present invention, a suppressor electrode 4 is disposed to cover a filament 3 and the needle-like electrode 1 excluding a portion, of the needle-like electrode 1, protruding from an opening part 5 of the suppressor electrode 4, and a diffusion supply source 9 for supplying zirconia that is diffused onto the surface of the needle-like electrode 1 is formed around the needle-like electrode 1, wherein the diffusion supply source 9 has a thickness of 10 μm or more in at least the portion covered by the suppressor electrode 4, and has a thickness of 100 nm or more in the portion protruding from the opening part 5.

Inventors:
TAKEI AKI (JP)
KATAGIRI SOUICHI (JP)
MATSUNAGA SOICHIRO (JP)
KAWANO HAJIME (JP)
DOI TAKASHI (JP)
Application Number:
PCT/JP2017/024942
Publication Date:
January 10, 2019
Filing Date:
July 07, 2017
Export Citation:
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Assignee:
HITACHI HIGH TECH CORP (JP)
International Classes:
H01J37/073; H01J1/304; H01J1/46; H01J9/02; H01J37/06
Foreign References:
JP2013084550A2013-05-09
JPH08250054A1996-09-27
Other References:
SAKAWA; SEIICHI ET AL.: "Electron emission characteristics of ZrO/W electron sources with a wide rage of tip radii", SURFACE AND INTERFACE ANALYSIS, vol. 35, 14 January 2003 (2003-01-14), pages 11 - 14, XP055677986
Attorney, Agent or Firm:
POLAIRE I.P.C. (JP)
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