Title:
FIGOPTICAL OBJECTIVE FOR OPERATION IN EUV SPECTRAL REGION
Document Type and Number:
WIPO Patent Application WO/2018/194975
Kind Code:
A3
Abstract:
A catoptric system having a reference axis and first, second, and third reflectors. The first reflector contains a pattern-source carrying a substantially one-dimensional pattern. A combination of the second and third reflectors is configured to form an optical image of the pattern, with a demagnification coefficient N > 1 in extreme UV light, and with only two beams of light that have originated at the first reflector as a result of irradiation of the first reflector with light incident upon it. An exposure apparatus employing the catoptric system and method of device manufacturing with the use of the exposure apparatus.
Inventors:
SMITH DANIEL (US)
WILLIAMSON DAVID (US)
WILLIAMSON DAVID (US)
Application Number:
PCT/US2018/027785
Publication Date:
February 07, 2019
Filing Date:
April 16, 2018
Export Citation:
Assignee:
NIKON CORP (JP)
SMITH DANIEL GENE (US)
WILLIAMSON DAVID M (US)
SMITH DANIEL GENE (US)
WILLIAMSON DAVID M (US)
International Classes:
G03F7/20; G02B17/06; G21K1/06
Foreign References:
| US20140253892A1 | 2014-09-11 | |||
| US20130070227A1 | 2013-03-21 | |||
| US6331710B1 | 2001-12-18 | |||
| US20140268086A1 | 2014-09-18 | |||
| US5003567A | 1991-03-26 |
Attorney, Agent or Firm:
SIDORIN, Yakov, S. (US)
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