Title:
FILM BASED ON SILICON DIOXIDE AND PRODUCTION THEREOF
Document Type and Number:
WIPO Patent Application WO/1991/002102
Kind Code:
A1
Abstract:
A film based on silicon dioxide and containing zirconium and so forth, and a method of producing the film by reactive DC sputtering. Various multilayered films containing said film, such as those used for antireflection coating, alkali barrier film, or achromatic glass can be produced by physical vapor deposition without breaking a vacuum.
Inventors:
ANDO EIICHI (JP)
MITSUI AKIRA (JP)
EBISAWA JUNICHI (JP)
SUZUKI KOICHI (JP)
MATSUMOTO KIYOSHI (JP)
OYAMA TAKUJI (JP)
MITSUI AKIRA (JP)
EBISAWA JUNICHI (JP)
SUZUKI KOICHI (JP)
MATSUMOTO KIYOSHI (JP)
OYAMA TAKUJI (JP)
Application Number:
PCT/JP1990/000982
Publication Date:
February 21, 1991
Filing Date:
August 01, 1990
Export Citation:
Assignee:
ASAHI GLASS CO LTD (JP)
International Classes:
B32B17/10; C03C17/245; C03C17/34; C03C27/12; C23C14/08; C23C14/10; C23C14/34; G02F1/1333; G02F1/1335; (IPC1-7): C03C3/06; C23C14/10; C23C14/34
Foreign References:
| JPS55110127A | 1980-08-25 | |||
| JPH06273202A | 1994-09-30 | |||
| JPS61144029A | 1986-07-01 | |||
| JPS61145823A | 1986-07-03 |
Other References:
See also references of EP 0436741A1
Attorney, Agent or Firm:
Yamamoto, Ryozo (38 Kanda-Higashimatsushitach, Chiyoda-ku Tokyo 101, JP)
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