Title:
FILM CLEANING SOLUTION AND METHOD FOR CLEANING FILM
Document Type and Number:
WIPO Patent Application WO/2022/107795
Kind Code:
A1
Abstract:
A film cleaning solution which contains a solvent and a metal removing agent, wherein: two or more kinds of solvents are contained; and the distance between the Hansen solubility parameter of this film cleaning solution and the Hansen solubility parameter of dimethylacetamide is 1.0 or less.
Inventors:
HIRANO ISAO (JP)
Application Number:
PCT/JP2021/042185
Publication Date:
May 27, 2022
Filing Date:
November 17, 2021
Export Citation:
Assignee:
TOKYO OHKA KOGYO CO LTD (JP)
International Classes:
B01D65/06; B01D71/26; B01D71/64; B08B3/10; C11D7/26; C11D7/50
Domestic Patent References:
| WO2004076040A1 | 2004-09-10 | |||
| WO2020009207A1 | 2020-01-09 |
Foreign References:
| JP2017202479A | 2017-11-16 | |||
| JP2017023976A | 2017-02-02 | |||
| JP2018122206A | 2018-08-09 | |||
| JP2006159062A | 2006-06-22 | |||
| JPS60204898A | 1985-10-16 | |||
| JPS55129106A | 1980-10-06 | |||
| JP2020190859A | 2020-11-26 | |||
| JP2017202479A | 2017-11-16 |
Other References:
TEAM HSPIP, YAMAMOTO HIROSHI, ABBOTT STEVEN, HANSEN CHARLES M: "Consideration of Hansen solubility parameters. Part 1 Dividing the dispersion term (δD) and new HSP distance", HANSEN SOLUBILITY PARAMETERS 50TH ANNIVERSARY CONFERENCE, THE HISTORIC 50TH ANNIVERSARY HSP CONFERENCE 5-7 APRIL 2017, YORK, UK, HANSEN-SOLUBILITY.COM, PIRIKA.COM, US, 1 January 2017 (2017-01-01), US, pages 1 - 13, XP055932270
Attorney, Agent or Firm:
TAZAKI Akira et al. (JP)
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