Login| Sign Up| Help| Contact|

Patent Searching and Data


Title:
FILM DEPOSITION DEVICE
Document Type and Number:
WIPO Patent Application WO/2017/150400
Kind Code:
A1
Abstract:
[Problem] To provide a film deposition device that can inhibit the infiltration of a gas, suppress the generation of particles resulting from the adhesion of deposited matter, and prevent the generation of crystal defects in the film that is formed. [Solution] A feeding unit 4 is provided with: a first partition 32; a second partition 401 that is disposed at a predetermined interval below the first partition; a third partition 402 that is disposed at a predetermined interval below the second partition; a first passage 431 into which a first gas is introduced, said first passage being disposed between the first partition and the second partition; a second passage 432 into which a second gas is introduced, said second passage being disposed between the second partition and the third partition; a first pipe 411 that communicates with the first passage from the second partition to below the third partition; a second pipe 421 that communicates with the second passage from the third partition to below the third partition, said second pipe being disposed so as to enclose the first pipe; and a protruding part that protrudes from an outer peripheral face 411c of the first pipe to an inner peripheral face 421b of the second pipe, or vice versa, said protruding part being disposed on the outer peripheral face of the first pipe or the inner peripheral face of the second pipe.

Inventors:
SUZUKI Kunihiko (Inc. 8-1, Shinsugita-cho, Isogo-ku, Yokohama-sh, Kanagawa 22, 〒2358522, JP)
IKEYA Naohisa (Inc. 8-1, Shinsugita-cho, Isogo-ku, Yokohama-sh, Kanagawa 22, 〒2358522, JP)
FUKADA Keisuke (1505 Shimokagemori, Chichibu-sh, Saitama 93, 〒3691893, JP)
ITO Masahiko (Materials Science Research Laboratory 2-6-1 Nagasaka, Yokosuka-sh, Kanagawa 96, 〒2400196, JP)
KAMATA Isaho (Materials Science Research Laboratory 2-6-1 Nagasaka, Yokosuka-sh, Kanagawa 96, 〒2400196, JP)
TSUCHIDA Hidekazu (Materials Science Research Laboratory 2-6-1 Nagasaka, Yokosuka-sh, Kanagawa 96, 〒2400196, JP)
FUJIBAYASHI Hiroaki (1-1 Showa-cho, Kariya-sh, Aichi 61, 〒4488661, JP)
UEHIGASHI Hideyuki (1-1 Showa-cho, Kariya-sh, Aichi 61, 〒4488661, JP)
NAITO Masami (1-1 Showa-cho, Kariya-sh, Aichi 61, 〒4488661, JP)
HARA Kazukuni (1-1 Showa-cho, Kariya-sh, Aichi 61, 〒4488661, JP)
AOKI Hirofumi (1 Toyota-cho, Toyota-sh, Aichi 71, 〒4718571, JP)
KOZAWA Takahiro (INC. 41-1, Yokomichi, Nagakute-sh, Aichi 92, 〒4801192, JP)
Application Number:
JP2017/007292
Publication Date:
September 08, 2017
Filing Date:
February 27, 2017
Export Citation:
Click for automatic bibliography generation   Help
Assignee:
NUFLARE TECHNOLOGY, INC. (8-1 Shinsugita-cho, Isogo-ku Yokohama-sh, Kanagawa 22, 〒2358522, JP)
SHOWA DENKO K.K. (13-9, Shiba Daimon 1-chome Minato-k, Tokyo 18, 〒1058518, JP)
CENTRAL RESEARCH INSTITUTE OF ELECTRIC POWER INDUSTRY (1-6-1 Otemachi, Chiyoda-ku Tokyo, 26, 〒1008126, JP)
International Classes:
H01L21/205; C23C16/455
Foreign References:
JP2000252270A2000-09-14
JP2000144432A2000-05-26
JP2004100001A2004-04-02
JP2010062383A2010-03-18
Attorney, Agent or Firm:
NAGAI Hiroshi et al. (Kyowa Patent & Law Office, Nippon Life Marunouchi Building Marunouchi 1-6-6, Chiyoda-k, Tokyo 05, 〒1000005, JP)
Download PDF: