Title:
FILM FORMATION METHOD AND FILM FORMATION DEVICE
Document Type and Number:
WIPO Patent Application WO/2020/059315
Kind Code:
A1
Abstract:
According to the present invention, a first liquid film that includes a first solvent is formed on one surface of a substrate. Then, a second liquid film that includes a second solvent that has a higher surface tension than the first solvent is formed on the first liquid film. Then, a resist liquid is supplied onto the second liquid film, and a resist film is thereby formed on the one surface of the substrate. The first solvent is propylene glycol monomethyl ether acetate, propylene glycol monomethyl ether, or a mixed solvent of propylene glycol monomethyl ether acetate and propylene glycol monomethyl ether.
Inventors:
WAJIKI TAKEHIRO (JP)
KANAOKA MASASHI (JP)
YAMADA YOSHIHISA (JP)
KANAOKA MASASHI (JP)
YAMADA YOSHIHISA (JP)
Application Number:
PCT/JP2019/030238
Publication Date:
March 26, 2020
Filing Date:
August 01, 2019
Export Citation:
Assignee:
SCREEN HOLDINGS CO LTD (JP)
International Classes:
H01L21/027; B05C9/06; B05C11/08; B05D1/36; B05D3/00; B05D7/24; G03F7/26
Foreign References:
JP2009279476A | 2009-12-03 | |||
JP2018081957A | 2018-05-24 | |||
JP2013214689A | 2013-10-17 | |||
JP2013225628A | 2013-10-31 | |||
JP2012000589A | 2012-01-05 |
Attorney, Agent or Firm:
NAKAGAWA, Masahiro et al. (JP)
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