FILM-FORMING APPARATUS, AND METHOD FOR CLEANING FILM-FORMING APPARATUS

WIPO Patent Application WO/2012/070560

A1

A film-forming apparatus (1) is provided with: a heat generating body (30), which generates a film-forming species when the heat generating body is brought into contact with a film-forming gas introduced into a chamber (10); a film-forming gas supply system (13), which supplies the film-forming gas to the inside of the chamber; a control unit (1C), which brings the heat generating body (30) into an unheated state at the time of cleaning the chamber by ejecting film formation residues adhered in the chamber; a cleaning gas supply system (21), which supplies a cleaning gas containing ClF3 to the inside of the chamber; a temperature adjusting unit, which adjusts the temperature inside of the chamber to a target temperature of 100-200°C at the time of cleaning the chamber; and an ejecting system (12b), which ejects, from the chamber, reaction products that are generated when the film formation residues and the cleaning gas reacted to each other.

JPS59180425	[Title of the device] Dispersion equipment
JP2976972	[Title of Invention] Gas Rectifier

OGAWA YOHEI (JP)
TOYODA SATORU (JP)
OKAMURA YOSHIHIRO (JP)

PCT/JP2011/076883

May 31, 2012

November 22, 2011

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ULVAC INC (JP)
OGAWA YOHEI (JP)
TOYODA SATORU (JP)
OKAMURA YOSHIHIRO (JP)

C23C16/44

JP4459329B2	2010-04-28
JP2009108390A	2009-05-21
JP2000150498A	2000-05-30
JP2010016086A	2010-01-21
JP2009194125A	2009-08-27

ONDA, Hironori et al. (JP)
Hironori Onda (JP)

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