FILM-FORMING COMPOSITION AND COSMETIC MATERIAL

Title:

FILM-FORMING COMPOSITION AND COSMETIC MATERIAL

Document Type and Number:

WIPO Patent Application WO/2016/035232

Kind Code:

A1

Abstract:

The present invention is a film-forming composition comprising a polymer obtained by polymerizing: (A) 5-80 mass% of a silicone resin which has R3SiO1/2, R2R'SiO1/2, and SiO2 units (where R, which may be the same as or different from each other, represents a monovalent hydrocarbon group having 1-6 carbon atoms, and R' represents a -C3H6SH group), in which the total amount of the R3SiO1/2, R2R'SiO1/2, and SiO2 units of all the structural units is 80 mol% or more, and which has a molar ratio expressed by (the sum of R3SiO1/2 unit and R2R'SiO1/2 unit)/(SiO2 unit) in a range of 0.5-1.5; and (B) 20-95 mass% of at least one radically polymerizable compound, wherein said (B) component includes at least one radically polymerizable monomer (B-1) which does not include the SiO unit in the structure thereof. Therefore, said film-forming composition is capable of forming a transparent film which has excellent adhesiveness, and does not exhibit stickiness or secondary adhesion.

Inventors:

AKABANE EMI (JP)

Application Number:

PCT/JP2015/003243

Publication Date:

March 10, 2016

Filing Date:

June 29, 2015

Export Citation:

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Assignee:

SHINETSU CHEMICAL CO (JP)

International Classes:

A61K8/899; A61K8/81; A61L15/00; A61Q5/00; A61Q19/00; C08F2/44; C08F283/12; C08F290/06; C08G77/28

Foreign References:

JP2003212998A	2003-07-30
JP2013245279A	2013-12-09
JP2009132850A	2009-06-18
JP2008274116A	2008-11-13
JP2001151830A	2001-06-05
JPH03126735A	1991-05-29
JP2009540052A	2009-11-19
JPH11508641A	1999-07-27
JPH0692825A	1994-04-05
JPH07268044A	1995-10-17

Other References: