Title:
FILM-FORMING COMPOSITION AND FILM-FORMING METHOD USING SAME
Document Type and Number:
WIPO Patent Application WO/2015/041207
Kind Code:
A1
Abstract:
[Problem] To provide a film-forming composition and a film-forming method with which it is possible to form a film having excellent gas barrier performance. [Solution] Disclosed is a film-forming composition comprising: a polysiloxane that does not include a hydroxyl group or a carboxyl group; a polysilazane; and an organic solvent. Also disclosed is a film-forming method comprising: coating a substrate with said composition; and exposing the same to light.
Inventors:
OZAKI YUKI (JP)
SATAKE NOBORU (JP)
KAWATO SHUNJI (JP)
KOBAYASHI MASAKAZU (JP)
SATAKE NOBORU (JP)
KAWATO SHUNJI (JP)
KOBAYASHI MASAKAZU (JP)
Application Number:
PCT/JP2014/074401
Publication Date:
March 26, 2015
Filing Date:
September 16, 2014
Export Citation:
Assignee:
AZ ELECTRONIC MATERIALS MFG JAPAN KK (JP)
International Classes:
C09D183/04; C08J7/048; C09D183/14; C09D183/16
Foreign References:
| JP2012106433A | 2012-06-07 | |||
| JP2010167777A | 2010-08-05 | |||
| JPH10279362A | 1998-10-20 | |||
| JP2000026727A | 2000-01-25 | |||
| JP2012148416A | 2012-08-09 | |||
| JP2009503157A | 2009-01-29 | |||
| JP2011173057A | 2011-09-08 | |||
| JP2011194766A | 2011-10-06 | |||
| JP2012006154A | 2012-01-12 | |||
| JP2009503157A | 2009-01-29 | |||
| JP2012148416A | 2012-08-09 | |||
| US6329487B1 | 2001-12-11 |
Other References:
See also references of EP 3048146A4
Attorney, Agent or Firm:
KATSUNUMA Hirohito et al. (JP)
Katsunuma Hirohito (JP)
Katsunuma Hirohito (JP)
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