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Title:
FILM-FORMING METHOD
Document Type and Number:
WIPO Patent Application WO/2010/041524
Kind Code:
A1
Abstract:
A film-forming method which comprises a first irradiation step wherein the surface of a substrate (101) is irradiated with particles having an energy, a first film-forming step wherein a first film (103) is formed on the surface of the substrate (101) by using a dry process after the first irradiation step, and a second film-forming step wherein an oil repellent second film (105) is formed on the surface of the first film (103).  The film-forming method enables production of an oil repellent base which has an oil repellent film having a practical wear resistance.

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Inventors:
SHIONO ICHIRO (JP)
NAGAE EKISHU (JP)
JIANG YOUSONG (JP)
SUGAWARA TAKUYA (JP)
Application Number:
PCT/JP2009/064731
Publication Date:
April 15, 2010
Filing Date:
August 24, 2009
Export Citation:
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Assignee:
SHINCRON CO LTD (JP)
SHIONO ICHIRO (JP)
NAGAE EKISHU (JP)
JIANG YOUSONG (JP)
SUGAWARA TAKUYA (JP)
International Classes:
C23C14/02; C03C17/42
Foreign References:
JPH08337874A1996-12-24
JPH05320874A1993-12-07
JPH11246690A1999-09-14
JP2007155802A2007-06-21
JPH05239243A1993-09-17
JPH10193489A1998-07-28
Other References:
See also references of EP 2336384A4
None
Attorney, Agent or Firm:
Sannozaka Patent Law Firm (JP)
Patent business corporation The Sanno hill patent firm (JP)
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