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Patent Searching and Data


Title:
FILM-FORMING METHOD
Document Type and Number:
WIPO Patent Application WO/2019/124135
Kind Code:
A1
Abstract:
The present invention addresses the problem of providing a film-forming method with which it is possible to increase the film formation speed when film formation is performed through aerosol deposition. This problem is solved by forming an aerosol of a raw material liquid containing a film-forming material, and by supplying the generated aerosol to a substrate being vibrated at a frequency not higher than 10 kHz so as to form, on the substrate, a film including the film-forming material.

Inventors:
HASEGAWA Masataka (210 Nakanuma, Minami-ashigara-sh, Kanagawa 93, 〒2500193, JP)
KANAZAWA Hayato (210 Nakanuma, Minami-ashigara-sh, Kanagawa 93, 〒2500193, JP)
Application Number:
JP2018/045260
Publication Date:
June 27, 2019
Filing Date:
December 10, 2018
Export Citation:
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Assignee:
FUJIFILM CORPORATION (26-30, Nishiazabu 2-chome Minato-k, Tokyo 20, 〒1068620, JP)
International Classes:
B05D1/02; B05D3/00; B05D3/02; B05D3/06; B05D3/10; B05D3/12; C23C24/04; G02F1/13
Foreign References:
JP2007027536A2007-02-01
JP2004195340A2004-07-15
JP2012216411A2012-11-08
JP2009091604A2009-04-30
JP2004046153A2004-02-12
JP2003142398A2003-05-16
Attorney, Agent or Firm:
ITOH Hideaki et al. (XYMAX Iwamoto-cho Building 6F, 3-3 Iwamoto-cho 2-chome, Chiyoda-k, Tokyo 32, 〒1010032, JP)
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