Title:
FILM MATERIAL
Document Type and Number:
WIPO Patent Application WO/2003/072350
Kind Code:
A1
Abstract:
A gas barrier layer and a light resisting layer to be able to be used in an atmosphere of -80°C to 80°C are formed on a base fabric composed of a plurality of sheet-form yarn groups each having yarns arranged in one direction, respective sheet-form yarn groups being placed in layers so that the arranging direction of yarns are different from one another, and the intersections of respective yarns being integrally bonded with adhesive, thereby it is possible to provide a film material that is excellent in light resistance, light in weight, high in strength, and capable of suitably used for the ship body material of a soft air ship or the like applicable to earth observing, meteorological observing and radio repeating.
More Like This:
| WO/2005/023537 | CUT-RESISTANT COMPOSITE |
Inventors:
MORI HIROYUKI (JP)
Application Number:
PCT/JP2003/002072
Publication Date:
September 04, 2003
Filing Date:
February 25, 2003
Export Citation:
Assignee:
TEIJIN LTD (JP)
MORI HIROYUKI (JP)
MORI HIROYUKI (JP)
International Classes:
B32B5/08; B64B1/58; (IPC1-7): B32B5/02; B64B1/58
Domestic Patent References:
| WO1996010666A1 | 1996-04-11 |
Foreign References:
| JPH04235035A | 1992-08-24 | |||
| JP2001334594A | 2001-12-04 | |||
| JP2001277391A | 2001-10-09 | |||
| JP2001239605A | 2001-09-04 |
Attorney, Agent or Firm:
Mihara, Hideko c/o Teijin Intellectual Property Center Limited (1-1 Uchisaiwaicho 2-chom, Chiyoda-ku Tokyo, JP)
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