Title:
FILM PATTERN WRITING METHOD, COATING FILM BASE MATERIAL, AND COATING DEVICE
Document Type and Number:
WIPO Patent Application WO/2017/090547
Kind Code:
A1
Abstract:
Provided are a film pattern writing method, coating film base material, and coating device that make it possible, when forming a film pattern on a base material by an inkjet process, to increase image writing performance and suppress an increase in film pattern forming time associated with an improvement in image writing performance.
Specifically, a film pattern writing method for forming a film pattern by inkjetting droplets in a film forming region on a base material comprises: an underlayer film forming step of forming an underlayer film pattern by ejecting a small quantity of droplets allowing for writing an image in the film forming region on the base material; and a thick film forming step of forming a film pattern by ejecting a greater quantity of droplets on the underlayer film pattern than the droplets with which the underlayer film pattern is formed.
Inventors:
FUKUSHIMA YUGO (JP)
TOMOEDA SATOSHI (JP)
TOMOEDA SATOSHI (JP)
Application Number:
PCT/JP2016/084377
Publication Date:
June 01, 2017
Filing Date:
November 21, 2016
Export Citation:
Assignee:
TORAY ENG CO LTD (JP)
International Classes:
B05D1/26; B05C5/00; B05C9/06; B05D1/36; B41J2/01; B41M5/00
Domestic Patent References:
| WO2016129443A1 | 2016-08-18 | |||
| WO2012036232A1 | 2012-03-22 |
Foreign References:
| JP2010241050A | 2010-10-28 | |||
| JP2014075546A | 2014-04-24 | |||
| JP2014069511A | 2014-04-21 | |||
| JP2009279538A | 2009-12-03 | |||
| JP2005199609A | 2005-07-28 | |||
| JP2004305990A | 2004-11-04 |
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