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Patent Searching and Data


Title:
FILM PROCESSING UNIT AND SUBSTRATE PROCESSING DEVICE
Document Type and Number:
WIPO Patent Application WO/2017/082064
Kind Code:
A1
Abstract:
A film processing unit, wherein: a nozzle is housed inside a nozzle housing hole of a standby pot; in this state, a cleaning solution is discharged from a plurality of discharge ports onto the outer-peripheral surface of the nozzle; as a result, a coating fluid adhered to the nozzle, a solidified product thereof, and the like are dissolved and removed from the nozzle; next, a metal-removing solution is discharged from the plurality of discharge ports onto the outer-circumferential surface of the nozzle; as a result, a metal component remaining on the nozzle is dissolved and removed from the nozzle; and in addition, purified water is discharged from the plurality of discharge ports onto the outer-peripheral surface of the nozzle, and any of the metal-removing solution adhered to the nozzle is washed away.

Inventors:
TANAKA YUJI (JP)
ASAI MASAYA (JP)
HARUMOTO MASAHIKO (JP)
KANEYAMA KOJI (JP)
Application Number:
PCT/JP2016/081847
Publication Date:
May 18, 2017
Filing Date:
October 27, 2016
Export Citation:
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Assignee:
SCREEN HOLDINGS CO LTD (JP)
International Classes:
H01L21/027; B05C5/00; B05C11/10; H01L21/304
Foreign References:
JP2003178965A2003-06-27
JP2004296991A2004-10-21
JP2013076973A2013-04-25
JP2010062352A2010-03-18
JP2009158924A2009-07-16
JP2000338684A2000-12-08
JPH1187292A1999-03-30
JP2007318016A2007-12-06
JP2001319910A2001-11-16
JP2009126940A2009-06-11
JP2008270509A2008-11-06
Attorney, Agent or Firm:
FUKUSHIMA, Yoshito (JP)
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