Login| Sign Up| Help| Contact|

Patent Searching and Data


Title:
FILM SURFACE TREATMENT METHOD AND FILM SURFACE TREATMENT DEVICE
Document Type and Number:
WIPO Patent Application WO/2020/143452
Kind Code:
A1
Abstract:
A film surface treatment method and a film surface treatment device, substances on a film surface can be etched away by using hydrofluoric acid to etch the film surface. Residual hydrofluoric acid on the film surface is removed by using a cleaning solution to clean hydrofluoric acid on the film surface after the etching treatment, which can avoid excessive etching of the film caused by the residual hydrofluoric acid. Thus, a dense and uniform oxide layer can be formed on the film surface by using ozone water to oxidize the film surface after the cleaning treatment. Therefore, the ELA process effect can be improved while performing the ELA process.

Inventors:
DENG ZHIGUO (CN)
WANG ZHEN (CN)
YAN XI (CN)
GUO ZHAO (CN)
LI FAYE (CN)
HUANG CHAO (CN)
LIU JIE (CN)
LIU YAN (CN)
LI XIANJIE (CN)
Application Number:
PCT/CN2019/128322
Publication Date:
July 16, 2020
Filing Date:
December 25, 2019
Export Citation:
Click for automatic bibliography generation   Help
Assignee:
BOE TECHNOLOGY GROUP CO LTD (CN)
CHENGDU BOE OPTOELECT TECH CO (CN)
International Classes:
H01L21/02; H01L21/677
Foreign References:
CN109742015A2019-05-10
CN104576318A2015-04-29
CN104576318A2015-04-29
CN104051311A2014-09-17
CN104496197A2015-04-08
CN108878272A2018-11-23
Attorney, Agent or Firm:
TDIP & PARTNERS (CN)
Download PDF: