FILM THICKNESS MEASUREMENT DEVICE AND FILM THICKNESS MEASUREMENT METHOD

Title:

FILM THICKNESS MEASUREMENT DEVICE AND FILM THICKNESS MEASUREMENT METHOD

Document Type and Number:

WIPO Patent Application WO/2011/045967

Kind Code:

A1

Abstract:

A film thickness measurement device (1A) comprises: a measurement light source (28) which supplies to a semiconductor film (15) measurement light including wavelength components spanning a prescribed band; a spectral optical system (30) and a photodetector (31) which detect for each wavelength the intensity, at each point in time, of output light formed by superimposing reflected light from the upper surface and lower surface of the semiconductor film (15); and a film thickness analysis section (40) which obtains the change over time of the film thickness (d) of the semiconductor film (15). The film thickness analysis section (40) obtains, based on each spectral waveform of the output light detected at mutually different points in time (T1, T2), numerical values corresponding to the interval of the peak wavelength or adjacent peak wavelength at which the intensity of the interference light, produced by mutual interference of the reflected light from the upper surface and the reflected light from the lower surface, is at the maximum or minimum intensity, and obtains the change over time of the film thickness (d) of the semiconductor film (15) from the change over time of said numerical values. As a result, a film thickness measurement device and film thickness measurement method can be implemented which make it possible to accurately measure the amount of change in film thickness, even when the relative amount of change in film thickness is so minute as to be less than the full period of the peak of interference light intensity.

Inventors:

OHTSUKA KENICHI (JP)
NAKANO TETSUHISA (JP)
WATANABE MOTOYUKI (JP)

Application Number:

PCT/JP2010/062607

Publication Date:

April 21, 2011

Filing Date:

July 27, 2010

Export Citation:

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Assignee:

HAMAMATSU PHOTONICS KK (JP)
OHTSUKA KENICHI (JP)
NAKANO TETSUHISA (JP)
WATANABE MOTOYUKI (JP)

International Classes:

G01B11/06

Foreign References:

JP2010230515A	2010-10-14
JPS5575605A	1980-06-07
JPH1114312A	1999-01-22
JPS6350703A	1988-03-03