Title:
FILTER DEVICE CLEANING METHOD, FILTRATION EQUIPMENT, AND DESALINATION PLANT
Document Type and Number:
WIPO Patent Application WO/2017/183130
Kind Code:
A1
Abstract:
A cleaning method for a filter device that has deposits of a polymer flocculant deposited at an entrance part of a filter layer thereof. The cleaning method comprises: a step for supplying a cleaning liquid that includes an alkaline solution into the filter device such that at least the entrance part of the filter layer is immersed in the cleaning liquid; and a step for removing the deposits that have been immersed in the cleaning solution from the filter layer.
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Inventors:
ITO YOSHIAKI (JP)
NAKAMURA KOZO (JP)
NAKAMURA KOZO (JP)
Application Number:
PCT/JP2016/062493
Publication Date:
October 26, 2017
Filing Date:
April 20, 2016
Export Citation:
Assignee:
MITSUBISHI HEAVY IND LTD (JP)
International Classes:
B01D29/62; C02F1/44; C02F1/56; C02F3/02
Foreign References:
| JPS5912715A | 1984-01-23 | |||
| JPH10258295A | 1998-09-29 | |||
| JP2014050806A | 2014-03-20 | |||
| JP2011189242A | 2011-09-29 | |||
| JP2004089782A | 2004-03-25 | |||
| JPH0871318A | 1996-03-19 | |||
| JPS5745317A | 1982-03-15 | |||
| JPH06198294A | 1994-07-19 |
Attorney, Agent or Firm:
SEISHIN IP PATENT FIRM, P.C. (JP)
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