Title:
FINE-BUBBLE CLEANING DEVICE AND FINE-BUBBLE CLEANING METHOD
Document Type and Number:
WIPO Patent Application WO/2020/075844
Kind Code:
A1
Abstract:
The present invention addresses the problem that, when it is desired to utilize fine bubbles for cleaning a semiconductor or an electronic device, it may not be possible to effectively utilize the energy upon destruction of fine bubbles because nano-bubbles are stable and have a long lifetime, and microbubbles mostly disappear when transported by piping. This fine-bubble cleaning device is characterized by comprising: a fine-bubble generation device which causes at least nano-order fine bubbles to be generated in a cleaning solution to generate a nanobubble cleaning solution; a cleaning nozzle for ejecting the nanobubble cleaning solution toward an object to be cleaned; and a collision processing body disposed between the cleaning nozzle and the object to be cleaned. The fine-bubble cleaning device generates micro bubbles just before the micro bubbles are contacted with the object to be cleaned, making it possible to perform effective cleaning.
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Inventors:
HIDAKA YOSHIHARU
UEDA YOSHIKATSU
UEDA YOSHIKATSU
Application Number:
PCT/JP2019/040253
Publication Date:
April 16, 2020
Filing Date:
October 11, 2019
Export Citation:
Assignee:
PANASONIC IP MAN CO LTD (JP)
International Classes:
H01L21/304; B08B3/02; B08B3/10
Domestic Patent References:
WO2008087903A1 | 2008-07-24 | |||
WO2011101936A1 | 2011-08-25 |
Foreign References:
JP2016092340A | 2016-05-23 |
Attorney, Agent or Firm:
HIROKOH Masaki (JP)
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