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Title:
FINE METAL MASK, DISPLAY SUBSTRATE, AND ALIGNMENT METHOD THEREFOR
Document Type and Number:
WIPO Patent Application WO/2018/054306
Kind Code:
A1
Abstract:
A fine metal mask (100), comprising a pattern area (110) comprising a plurality of openings; and a plurality of alignment holes (120) located outside the pattern area (110). Also disclosed are a display substrate (200) and an alignment method for the fine metal mask (100) for evaporation.

Inventors:
LI WEILI (CN)
WANG XULIANG (CN)
GAN SHUAIYAN (CN)
Application Number:
PCT/CN2017/102481
Publication Date:
March 29, 2018
Filing Date:
September 20, 2017
Export Citation:
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Assignee:
KUNSHAN GOVISIONOX OPTOELECTRONICS CO LTD (CN)
International Classes:
C23C14/04; C23C14/24; H01L23/544; H01L51/00; H01L51/52
Foreign References:
CN206015074U2017-03-15
CN105549320A2016-05-04
CN103205694A2013-07-17
CN103695846A2014-04-02
JP2006114402A2006-04-27
Other References:
See also references of EP 3489384A4
Attorney, Agent or Firm:
ADVANCE CHINA IP LAW OFFICE (CN)
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