Title:
FINE METAL STRUCTURE, PROCESS FOR PRODUCING THE SAME, FINE METAL MOLD AND DEVICE
Document Type and Number:
WIPO Patent Application WO/2005/063612
Kind Code:
A1
Abstract:
A fine metal structure having its surface furnished with microprojections of high strength, high precision and large aspect ratio; and a process for producing the fine metal structure free of defects. There is provided a fine metal structure having its surface furnished with microprojections, characterized in that the microprojections have a minimum thickness or minimum diameter ranging from 10 nanometers to 10 micrometers and that the ratio between minimum thickness or minimum diameter (D) of microprojections and height of microprojections (H), H/D, is greater than 1. There is further provided a process for producing a fine metal structure, characterized by comprising providing a substrate having a fine rugged pattern on its surface, applying a molecular electroless plating catalyst to the surface, thereafter carrying out electroless plating to thereby form a metal layer having the rugged pattern filled, and detaching the metal layer from the substrate to thereby obtain a fine metal structure furnished with a surface having undergone reversal transfer of the above rugged pattern.
Inventors:
Yoshida, Hiroshi c/o Hitachi Research Laboratory (HITACHI LTD., 1-1, Omikacho 7-chome, Hitachi-sh, Ibaraki 21, 31912, JP)
Akahoshi, Haruo c/o Hitachi Research Laboratory (HITACHI LTD., 1-1, Omikacho 7-chome, Hitachi-sh, Ibaraki 21, 31912, JP)
Miyauchi, Akihiro c/o Hitachi Research Laboratory (HITACHI LTD., 1-1, Omikacho 7-chome, Hitachi-sh, Ibaraki 21, 31912, JP)
Ogino, Masahiko c/o Hitachi Research Laboratory (HITACHI LTD., 1-1, Omikacho 7-chome, Hitachi-sh, Ibaraki 21, 31912, JP)
Akahoshi, Haruo c/o Hitachi Research Laboratory (HITACHI LTD., 1-1, Omikacho 7-chome, Hitachi-sh, Ibaraki 21, 31912, JP)
Miyauchi, Akihiro c/o Hitachi Research Laboratory (HITACHI LTD., 1-1, Omikacho 7-chome, Hitachi-sh, Ibaraki 21, 31912, JP)
Ogino, Masahiko c/o Hitachi Research Laboratory (HITACHI LTD., 1-1, Omikacho 7-chome, Hitachi-sh, Ibaraki 21, 31912, JP)
Application Number:
PCT/JP2004/019116
Publication Date:
July 14, 2005
Filing Date:
December 21, 2004
Export Citation:
Assignee:
HITACHI, LTD. (6-6. Marunouchi 1-chome, Chiyoda-ku Tokyo, 80, 10082, JP)
Yoshida, Hiroshi c/o Hitachi Research Laboratory (HITACHI LTD., 1-1, Omikacho 7-chome, Hitachi-sh, Ibaraki 21, 31912, JP)
Akahoshi, Haruo c/o Hitachi Research Laboratory (HITACHI LTD., 1-1, Omikacho 7-chome, Hitachi-sh, Ibaraki 21, 31912, JP)
Miyauchi, Akihiro c/o Hitachi Research Laboratory (HITACHI LTD., 1-1, Omikacho 7-chome, Hitachi-sh, Ibaraki 21, 31912, JP)
Ogino, Masahiko c/o Hitachi Research Laboratory (HITACHI LTD., 1-1, Omikacho 7-chome, Hitachi-sh, Ibaraki 21, 31912, JP)
Yoshida, Hiroshi c/o Hitachi Research Laboratory (HITACHI LTD., 1-1, Omikacho 7-chome, Hitachi-sh, Ibaraki 21, 31912, JP)
Akahoshi, Haruo c/o Hitachi Research Laboratory (HITACHI LTD., 1-1, Omikacho 7-chome, Hitachi-sh, Ibaraki 21, 31912, JP)
Miyauchi, Akihiro c/o Hitachi Research Laboratory (HITACHI LTD., 1-1, Omikacho 7-chome, Hitachi-sh, Ibaraki 21, 31912, JP)
Ogino, Masahiko c/o Hitachi Research Laboratory (HITACHI LTD., 1-1, Omikacho 7-chome, Hitachi-sh, Ibaraki 21, 31912, JP)
International Classes:
G01N33/53; B29C33/38; B29C33/42; B81C1/00; B81C99/00; B82B3/00; C12M1/00; C12N15/09; C23C18/16; C23C18/42; G01N37/00; H01J1/304; H01J9/02; H01L21/027; (IPC1-7): B81B1/00; B29C33/38; B81C1/00; B82B1/00; B82B3/00; H01L21/027
Attorney, Agent or Firm:
Asamura, Kiyoshi (Room 331, New Ohtemachi Bldg. 2-1, Ohtemachi 2-chome, Chiyoda-k, Tokyo 04, 10000, JP)
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