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Patent Searching and Data


Title:
FINE PATTERN FORMING METHOD AND FINE PATTERN FORMING DEVICE
Document Type and Number:
WIPO Patent Application WO/2006/003921
Kind Code:
A1
Abstract:
A fine pattern forming method and a fine pattern forming device. In the method for realizing a high aspect ratio structure which could not be achieved by a conventional technology, a mold on which a fine pattern having a fine recessed and projected structure is pressed against a patterning material to form the fine pattern with the fine recessed and projected structure on the patterning material. The method comprises a first step for pressing the mold, on which the fine pattern with the fine recessed and projected structure is formed, against the patterning material, a second step for moving, relative to each other, the pressed mold and the patterning material in a direction orthogonal to the pressing direction, and a third step for releasing the pressing of the mold against the patterning material and withdrawing the mold from the patterning material.

Inventors:
Okinaka, Motoki
Tsukagoshi, Kazuhito
Aoyagi, Yoshinobu
Application Number:
PCT/JP2005/011925
Publication Date:
January 12, 2006
Filing Date:
June 29, 2005
Export Citation:
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Assignee:
Riken (2-1 Hirosawa, Wako-shi Saitama, 98, 35101, JP)
Okinaka, Motoki
Tsukagoshi, Kazuhito
Aoyagi, Yoshinobu
International Classes:
B29C59/02; H01L21/027; (IPC1-7): H01L21/027; B29C59/02
Attorney, Agent or Firm:
Ueshima, Junichi (5-11-404, Nishi Ikebukuro 1-chome Toshima-ku, Tokyo 21, 17100, JP)
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