Login| Sign Up| Help| Contact|

Patent Searching and Data


Title:
FINE PATTERN FORMING METHOD AND FINE PATTERN FORMING DEVICE
Document Type and Number:
WIPO Patent Application WO/2006/003921
Kind Code:
A1
Abstract:
A fine pattern forming method and a fine pattern forming device. In the method for realizing a high aspect ratio structure which could not be achieved by a conventional technology, a mold on which a fine pattern having a fine recessed and projected structure is pressed against a patterning material to form the fine pattern with the fine recessed and projected structure on the patterning material. The method comprises a first step for pressing the mold, on which the fine pattern with the fine recessed and projected structure is formed, against the patterning material, a second step for moving, relative to each other, the pressed mold and the patterning material in a direction orthogonal to the pressing direction, and a third step for releasing the pressing of the mold against the patterning material and withdrawing the mold from the patterning material.

Inventors:
OKINAKA MOTOKI
TSUKAGOSHI KAZUHITO
AOYAGI YOSHINOBU
Application Number:
PCT/JP2005/011925
Publication Date:
January 12, 2006
Filing Date:
June 29, 2005
Export Citation:
Click for automatic bibliography generation   Help
Assignee:
RIKEN (JP)
OKINAKA MOTOKI
TSUKAGOSHI KAZUHITO
AOYAGI YOSHINOBU
International Classes:
B29C59/02; H01L21/027; (IPC1-7): H01L21/027; B29C59/02
Domestic Patent References:
WO2004000567A12003-12-31
WO2004021083A12004-03-11
WO2000065408A12000-11-02
WO2001033300A22001-05-10
Foreign References:
JP2004146601A2004-05-20
JP2002063741A2002-02-28
Attorney, Agent or Firm:
Ueshima, Junichi (Nishi Ikebukuro 1-chome Toshima-ku, Tokyo 21, JP)
Download PDF: