FINE STRUCTURE TRANSFER APPARATUS AND FINE STRUCTURE TRANSFER METHOD

WIPO Patent Application WO/2011/111792

A1

Disclosed is a fine structure transfer apparatus wherein a time required for substrate transfer between process steps is shortened, a space necessary for a transfer step is reduced, and the footprint is small. In the fine structure transfer apparatus, in order to improve the productivity the apparatus, a thin resin film is formed on the substrate, then the thin resin film is hardened in a state wherein a molding die having a fine pattern formed thereon is pressed onto the thin resin film, and the fine pattern is formed on the substrate. The apparatus is provided with a pattern transfer mechanism having a resin applying mechanism, a substrate handling mechanism, an aligning mechanism, a pressurizing mechanism, and a peeling mechanism. A pressurizing mechanism is configured of an upper head section and a lower stage section, the molding die having the fine pattern formed thereon is fixed on the lower surface of the upper head section, and after pressurization and transfer, the lower stage section retracts from a position below the substrate in the state wherein the substrate is adhered to the molding die, then, after the peeling mechanism is moved to a position below the substrate, the substrate adhered to the molding die is peeled.

SHIRAISHI Toshimitsu (HITACHI HIGH-TECHNOLOGIES CORPORATION 1600 Kami, Kamisato-machi, Kodama-gu, Saitama 95, 〒3690395, JP)
白石　敏光 (〒95 埼玉県児玉郡上里町嘉美１６００番地　株式会社日立ハイテクノロジーズ　埼玉事業所内 Saitama, 〒3690395, JP)
MORI Kyoichi (HITACHI HIGH-TECHNOLOGIES CORPORATION 1600 Kami, Kamisato-machi, Kodama-gu, Saitama 95, 〒3690395, JP)
森　恭一 (〒95 埼玉県児玉郡上里町嘉美１６００番地　株式会社日立ハイテクノロジーズ　埼玉事業所内 Saitama, 〒3690395, JP)
SHIZAWA Noritake (HITACHI HIGH-TECHNOLOGIES CORPORATION 1600 Kami, Kamisato-machi, Kodama-gu, Saitama 95, 〒3690395, JP)
志澤　礼健 (〒95 埼玉県児玉郡上里町嘉美１６００番地　株式会社日立ハイテクノロジーズ　埼玉事業所内 Saitama, 〒3690395, JP)

JP2011/055690

September 15, 2011

March 10, 2011

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HITACHI HIGH-TECHNOLOGIES CORPORATION (24-14, Nishi-Shimbashi 1-chome Minato-k, Tokyo 17, 〒1058717, JP)
株式会社日立ハイテクノロジーズ (〒17 東京都港区西新橋一丁目２４番１４号 Tokyo, 〒1058717, JP)
SHIRAISHI Toshimitsu (HITACHI HIGH-TECHNOLOGIES CORPORATION 1600 Kami, Kamisato-machi, Kodama-gu, Saitama 95, 〒3690395, JP)
白石　敏光 (〒95 埼玉県児玉郡上里町嘉美１６００番地　株式会社日立ハイテクノロジーズ　埼玉事業所内 Saitama, 〒3690395, JP)
MORI Kyoichi (HITACHI HIGH-TECHNOLOGIES CORPORATION 1600 Kami, Kamisato-machi, Kodama-gu, Saitama 95, 〒3690395, JP)
森　恭一 (〒95 埼玉県児玉郡上里町嘉美１６００番地　株式会社日立ハイテクノロジーズ　埼玉事業所内 Saitama, 〒3690395, JP)
SHIZAWA Noritake (HITACHI HIGH-TECHNOLOGIES CORPORATION 1600 Kami, Kamisato-machi, Kodama-gu, Saitama 95, 〒3690395, JP)

H01L21/027; B29C59/02; G11B5/84

POLAIRE I.P.C. (7-1 Hatchobori 2-chome, Chuo-ku Tokyo, 32, 〒1040032, JP)

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