Title:
FLOW CONTROL SYSTEM FOR LIQUID PROCESS MATERIAL AND PROCESS MONITORING SYSTEM USING SAME
Document Type and Number:
WIPO Patent Application WO/2020/017707
Kind Code:
A1
Abstract:
The present invention relates to a flow control system configured to uniformly supply a liquid process material, which is used in a manufacturing process for a semiconductor, an LCD, an LED, etc., according to a predetermined amount. The prior art flow control systems have problems in that malfunctions or abnormal operations frequently occur, and although an abnormality in the system operation or supply flow rate occurs, the component in which the abnormality occurs cannot be found. In order to solve these problems, the present invention provides a flow control system for a liquid process material and a process monitoring system using same, wherein: an injection valve (IV) and a liquid mass flow controller (LMFC) for supplying, at a constant flow rate, a liquid material for a semiconductor, LCD, or LED manufacturing process are linked with each other so as to doubly control the flow rate and thus the liquid process material can be normally supplied at the constant flow rate even when an abnormality occurs in one of the LMFC and the IV; and control power applied to the LMFC and the IV is measured in real time so as to determine whether an abnormality occurs, and thus when an abnormality occurs, the component in which the abnormality occurs can be quickly and accurately identified.
Inventors:
KIM YOUNG TAK (KR)
Application Number:
PCT/KR2018/014608
Publication Date:
January 23, 2020
Filing Date:
November 26, 2018
Export Citation:
Assignee:
KIM YOUNG TAK (KR)
International Classes:
G05D7/06; G02F1/13; G05B19/418; G05B23/02; H01L51/56
Foreign References:
| KR20100048403A | 2010-05-11 | |||
| JP2006346563A | 2006-12-28 | |||
| KR20060088324A | 2006-08-04 | |||
| KR20070085847A | 2007-08-27 | |||
| JP2015087110A | 2015-05-07 |
Attorney, Agent or Firm:
KIM, Jung Su (KR)
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