Title:
FLOW RATE CONTROL DEVICE
Document Type and Number:
WIPO Patent Application WO/2019/107215
Kind Code:
A1
Abstract:
A flow rate control device (100) is provided with: a pressure control valve (6) that is provided to a flow path; a flow rate control valve (8) that is provided to the downstream side of the pressure control valve; and a first pressure sensor (3) that measures pressure on the downstream side of the pressure control valve and the upstream side of the flow rate control valve. The flow rate control valve has: a valve body (13) that is seated on/separated from a valve seat (12); a piezoelectric element (10b) for moving the valve body so as to be seated on/separated from the valve seat; and a strain sensor (20) that is installed on a side surface of the piezoelectric element. The pressure control valve (6) is controlled on the basis of a signal outputted from the first pressure sensor (3). Driving of the piezoelectric element of the flow rate control valve (8) is controlled on the basis of a signal outputted from the strain sensor (20).
Inventors:
SUGITA KATSUYUKI (JP)
DOHI RYOUSUKE (JP)
HIRATA KAORU (JP)
KAWADA KOJI (JP)
IKEDA NOBUKAZU (JP)
NISHINO KOUJI (JP)
DOHI RYOUSUKE (JP)
HIRATA KAORU (JP)
KAWADA KOJI (JP)
IKEDA NOBUKAZU (JP)
NISHINO KOUJI (JP)
Application Number:
PCT/JP2018/042795
Publication Date:
June 06, 2019
Filing Date:
November 20, 2018
Export Citation:
Assignee:
FUJIKIN KK (JP)
International Classes:
G05D7/06
Foreign References:
| JP2013228950A | 2013-11-07 | |||
| JP2012033188A | 2012-02-16 | |||
| JP2008008356A | 2008-01-17 |
Attorney, Agent or Firm:
TANIDA Ryuichi et al. (JP)
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