FLOW RATE MEASURING DEVICE AND GAS SUPPLY SYSTEM EMPLOYING IT, METHOD FOR SPECIFYING GAS APPLIANCE

Title:

FLOW RATE MEASURING DEVICE AND GAS SUPPLY SYSTEM EMPLOYING IT, METHOD FOR SPECIFYING GAS APPLIANCE

Document Type and Number:

WIPO Patent Application WO/2008/072587

Kind Code:

A1

Abstract:

A flow rate measuring device has a flow rate measuring section, an appliance registering section, an operating section, a judging section, a first appliance judging section and a second appliance judging section. The appliance registering section stores the gas flow rate variation profile of each gas appliance connected with a channel at at least the starting time, and the gas flow rate variation profile based on the control specific to each gas appliance. The first appliance judging section specifies which gas appliance has started from the gas flow rate variation profile at the starting time. When the judging section detects stoppage of any one gas appliance, the second appliance judging section specifies a gas appliance which has been used continuously from the gas flow rate variation profile based on the control specific to the gas appliance.

Inventors:

UMEKAGE YASUHIRO
MIYATA HAJIME
KAMON KENICHI

Application Number:

PCT/JP2007/073752

Publication Date:

June 19, 2008

Filing Date:

December 10, 2007

Export Citation:

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Assignee:

MATSUSHITA ELECTRIC IND CO LTD (JP)
UMEKAGE YASUHIRO
MIYATA HAJIME
KAMON KENICHI

International Classes:

G01F3/22; G01F1/66

Foreign References:

JP2003194331A	2003-07-09
JP2003149027A	2003-05-21
JP2003149075A	2003-05-21
JP2006313114A	2006-11-16
JP2006200801A	2006-08-03
JP2002071421A	2002-03-08
JP2003149027A	2003-05-21

Other References: