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Patent Searching and Data


Title:
FLOW REGULATING VALVE, FLOW RATE MEASURING DEVICE, FLOW CONTROL DEVICE, AND FLOW RATE MEASURING METHOD
Document Type and Number:
WIPO Patent Application WO/2003/067352
Kind Code:
A1
Abstract:
A flow regulating valve (11), which has a valve disk (11b) operably disposed in a flow channel and is capable of regulating the flow of fluid according to the valve opening degree of the valve disk (11b), is characterized by comprising a stress detecting means (13) for detecting the flow-channel-direction force component of a load applied to the valve disk by the fluid, and a valve opening degree detecting means (12) for detecting the degree of opening of the valve disk. The flow rate calculating means (14) finds the flow rate (Qm) from the stress (fm) obtained from the stress detecting means and from the valve opening degree (Ѳm) obtained from the valve opening degree detecting means. A control means (15) controls a valve disk driving means (18) on the basis of the flow rate to drive the valve disk for opening and closing. This makes it possible to find the flow rate with higher sensitivity and accuracy than in the prior art, the construction being compact and simple, providing stabilized data.

Inventors:
TANAKA TOSHIHARU (JP)
ICHINOSE TADAHARU (JP)
YATA KATSUHISA (JP)
Application Number:
PCT/JP2003/001272
Publication Date:
August 14, 2003
Filing Date:
February 06, 2003
Export Citation:
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Assignee:
TOYO VALVE CO LTD (JP)
TANAKA TOSHIHARU (JP)
ICHINOSE TADAHARU (JP)
YATA KATSUHISA (JP)
International Classes:
G01F1/00; G01F1/26; G01F1/28; G01F1/42; G05D7/06; (IPC1-7): G05D7/06; G01F1/28; G01F1/40
Foreign References:
JPH04102908A1992-04-03
JPH10320057A1998-12-04
Attorney, Agent or Firm:
Kobayashi, Tetsuo (17-2 Shimbashi 6-chom, Minato-ku Tokyo, JP)
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