Title:
FLUID CLEANING METHOD AND FLUID CLEANING APPARATUS
Document Type and Number:
WIPO Patent Application WO/2007/058285
Kind Code:
A1
Abstract:
Provided are a fluid cleaning method and a fluid cleaning apparatus by which a
fluid can be easily cleaned. A substance contained in the fluid is cleaned by irradiating
a solution which contains nitrous oxide with ultraviolet in a status where the
solution is brought into contact with the substance contained in the fluid.
Inventors:
SOTOAKA, Ryuji (Inc. Tokyo Research Laboratory, 1-1, Niijuku 6-chome, Katsushika-k, Tokyo 51, 1250051, JP)
外赤 隆二 (〒51 東京都葛飾区新宿６丁目１番１号 三菱瓦斯化学株式会社東京研究所内 Tokyo, 1250051, JP)
外赤 隆二 (〒51 東京都葛飾区新宿６丁目１番１号 三菱瓦斯化学株式会社東京研究所内 Tokyo, 1250051, JP)
Application Number:
JP2006/322921
Publication Date:
May 24, 2007
Filing Date:
November 17, 2006
Export Citation:
Assignee:
MITSUBISHI GAS CHEMICAL COMPANY, INC. (MITSUBISHI Building, 5-2 Marunouchi 2-chome, Chiyoda-k, Tokyo 24, 1008324, JP)
三菱瓦斯化学株式会社 (〒24 東京都千代田区丸の内２丁目５番２号 三菱ビル Tokyo, 1008324, JP)
SOTOAKA, Ryuji (Inc. Tokyo Research Laboratory, 1-1, Niijuku 6-chome, Katsushika-k, Tokyo 51, 1250051, JP)
三菱瓦斯化学株式会社 (〒24 東京都千代田区丸の内２丁目５番２号 三菱ビル Tokyo, 1008324, JP)
SOTOAKA, Ryuji (Inc. Tokyo Research Laboratory, 1-1, Niijuku 6-chome, Katsushika-k, Tokyo 51, 1250051, JP)
International Classes:
B01J19/12; A62D3/176; A62D3/38; B01D53/86; C01B13/32; C02F1/72; A62D101/20; A62D101/40; B01J19/12; A62D3/00; B01D53/86; C01B13/32; C02F1/72
Attorney, Agent or Firm:
MATSUO, Kenichiro (7th Floor, Shinkumi Akasaka Bldg. 10-17, Akasaka 1-chome, Chuo-ku, Fukuoka-sh, Fukuoka 42, 8100042, JP)
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