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Patent Searching and Data


Title:
FLUID DEVICE PRODUCTION METHOD AND FLUID DEVICE
Document Type and Number:
WIPO Patent Application WO/2023/248963
Kind Code:
A1
Abstract:
This fluid device production method comprises: a formation step for forming a laminate which includes a first substrate formed from a resin material that has transparency with respect to laser light, an intermediate layer laminated on the first substrate and formed from a resin material that is of the same type as the first substrate and that has an absorbent property with respect to the laser light, and a second substrate laminated on the intermediate layer and formed from a resin material that is of the same type as the first substrate and that has transparency with respect to the laser light, and in which a flow path is formed in the intermediate layer or in the surface of the first or second substrate that contacts the intermediate layer; and a joining step for joining the first substrate, the intermediate layer, and the second substrate by irradiating the laminate with laser light from the first substrate side or the second substrate side, so as to weld the first substrate and the intermediate layer, and also the intermediate layer and the second substrate, in a region irradiated with the laser light.

Inventors:
ISHIZAWA NAOYA (JP)
KOBAYASHI RYO (JP)
TAKUBO MAKIKO (JP)
SHIONO HIROFUMI (JP)
NAKAYA HIDEYUKI (JP)
Application Number:
PCT/JP2023/022510
Publication Date:
December 28, 2023
Filing Date:
June 16, 2023
Export Citation:
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Assignee:
IXFLOW INC (JP)
NIKON CORP (JP)
International Classes:
B29C65/16; B01J19/00; G01N35/08; G01N37/00
Foreign References:
JP2009128342A2009-06-11
JP2009180577A2009-08-13
US20130061961A12013-03-14
US20070051461A12007-03-08
Attorney, Agent or Firm:
AN Youhee (JP)
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