Title:
FLUID HANDLING DEVICE, FLUID HANDLING METHOD, AND FLOW PATH CHIP
Document Type and Number:
WIPO Patent Application WO/2018/030253
Kind Code:
A1
Abstract:
This fluid handling device has a substrate, a film, and a sliding member. The substrate has first flow paths, second flow paths, and partition walls formed between one end of the first flow paths and one end of the second flow paths. The film includes a substantially spherical-crown-shaped diaphragm, and is arranged above the substrate such that the diaphragm and the partition walls oppose one another. The sliding member has protrusions formed on the back surface thereof, and is arranged above the film with the back surface facing the film. The sliding member is able to slide on the film. By sliding on the film the sliding member is able switch alternately between a first state in which the protrusions are arranged so as not to oppose the partition walls, and the diaphragm is sandwiched therebetween, and a second state in which the protrusions are arranged opposing the partition walls, and the diaphragm is sandwiched therebetween.
Inventors:
ONO KOICHI
SUNAGA NOBUYA
SUNAGA NOBUYA
Application Number:
PCT/JP2017/028175
Publication Date:
February 15, 2018
Filing Date:
August 03, 2017
Export Citation:
Assignee:
ENPLAS CORP (JP)
International Classes:
F16K7/16; B01J19/00; F16K7/00; G01N35/00; G01N35/08; G01N37/00
Foreign References:
| JP2007085537A | 2007-04-05 | |||
| JP2011202681A | 2011-10-13 |
Other References:
See also references of EP 3499099A4
Attorney, Agent or Firm:
WASHIDA, Kimihito (JP)
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