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Title:
FLUID PROCESSING DEVICE AND PROCESSING LIQUID RECOVERY METHOD
Document Type and Number:
WIPO Patent Application WO/2018/025547
Kind Code:
A1
Abstract:
A fluid processing device is provided with: a fluid processing part that processes a sample while causing a fluid to flow through a flow path and is such that the fluid that has passed through the fluid processing part includes gas and liquid; a gas-liquid separation part that is connected to the outlet side of a backpressure valve, has a gas-liquid separation tube that is composed from a material that allows gas to pass but does not allow liquid to pass, and discharges the gas phase from the fluid flowing through the gas-liquid separation tube to the outside of the gas-liquid separation tube; and a liquid phase recovery part that is provided further to the downstream side than the gas-liquid separation part and recovers the liquid that has passed through the gas-liquid separation part.

Inventors:
TANAKA Katsuhiro (1 Nishinokyo-kuwabaracho, Nakagyo-ku, Kyoto-sh, Kyoto 11, 〒6048511, JP)
IWATA Yosuke (1 Nishinokyo-kuwabaracho, Nakagyo-ku, Kyoto-sh, Kyoto 11, 〒6048511, JP)
Application Number:
JP2017/024088
Publication Date:
February 08, 2018
Filing Date:
June 30, 2017
Export Citation:
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Assignee:
SHIMADZU CORPORATION (1 Nishinokyo-kuwabaracho, Nakagyo-ku Kyoto-sh, Kyoto 11, 〒6048511, JP)
International Classes:
G01N30/02; B01D19/00
Foreign References:
JP2009544042A2009-12-10
JP2009505810A2009-02-12
JP2015172025A2015-10-01
JP2010271041A2010-12-02
US20130180404A12013-07-18
Attorney, Agent or Firm:
NOGUCHI Daisuke (Noguchi Patent Office, Rapport Nanba Bldg. 9F 8-1, Motomachi 2-chome, Naniwa-ku, Osaka-sh, Osaka 16, 〒5560016, JP)
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