Title:
FLUID PROCESSING DEVICE
Document Type and Number:
WIPO Patent Application WO/2020/136780
Kind Code:
A1
Abstract:
Provided is a fluid treatment device having a novel configuration. This fluid treatment device F is provided with: an upstream-side treatment part defined by treatment surfaces 1, 2, which can be moved towards and away from each other and which rotate relative to each other; and a downstream-side treatment part disposed on the downstream side of the upstream-side treatment part. The upstream-side treatment part is configured so that a fluid being treated is passed through an upstream-side treatment space 3 defined by the treatment surfaces 1, 2, whereby an upstream-side treatment is performed on the fluid being treated. The downstream-side treatment part is provided with a downstream-side treatment space 81 connecting to the upstream-side treatment space 3. A part of a rotary member 10, 91, which rotates integrally with the rotating treatment surface 1, forms a part of a wall surface defining the downstream-side treatment space 81. The downstream-side treatment part is configured so as to be able to utilize the rotation of the rotary member 10, 91 to perform a downstream-side treatment on the fluid being treated in succession from the upstream-side treatment.
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Inventors:
ENOMURA MASAKAZU (JP)
Application Number:
PCT/JP2018/047984
Publication Date:
July 02, 2020
Filing Date:
December 26, 2018
Export Citation:
Assignee:
M TECHNIQUE CO LTD (JP)
International Classes:
B01J19/00; B01F27/93; B01F27/94; B01J19/12; B01J19/18
Domestic Patent References:
| WO2018220719A1 | 2018-12-06 |
Foreign References:
| JP2004318064A | 2004-11-11 | |||
| JP2011189348A | 2011-09-29 | |||
| KR20140083854A | 2014-07-04 | |||
| KR20160098662A | 2016-08-19 |
Attorney, Agent or Firm:
SAMEJIMA Takenobu (JP)
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