Title:
FLUORENE DERIVATIVE, AND PHOTOPOLYMERIZATION INITIATOR AND PHOTORESIST COMPOSITION CONTAINING SAME
Document Type and Number:
WIPO Patent Application WO/2017/023067
Kind Code:
A2
Abstract:
The present invention relates to a fluorene derivative, and a photopolymerization initiator and a photoresist composition containing the same. The fluorene derivative according to the present invention has an advantage of being capable of providing a photopolymerization initiator and a photoresist composition which can realize high sensitivity in a wide range absorption spectrum by containing a specific unsaturated substituent at the 9-position of fluorene.
Inventors:
KIM SUNG HYUN (KR)
KIM SANG HA (KR)
HEO YOON HEE (KR)
KIM SANG HA (KR)
HEO YOON HEE (KR)
Application Number:
PCT/KR2016/008451
Publication Date:
February 09, 2017
Filing Date:
August 01, 2016
Export Citation:
Assignee:
CHEME INC (KR)
International Classes:
C07C13/567; C07C13/72; C07C219/08; C07C219/22; G02B5/20; G03F7/00; G03F7/004
Attorney, Agent or Firm:
PLUS INTERNATIONAL IP LAW FIRM (KR)
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