Title:
FLUORINE-BASED POLYMER WITH LOW DIELECTRIC CONSTANT AND FLUORINE-BASED POLYMER COMPOSITION COMPRISING SAME
Document Type and Number:
WIPO Patent Application WO/2023/003214
Kind Code:
A1
Abstract:
An aspect of the present invention is to provide a fluorine-based polymer showing a significantly low dielectric constant of less than 1.8 and a fluorine-based polymer composition comprising same. The fluorine-based polymer provided according to an aspect of the present invention shows a very low dielectric constant, wherein the polymer is not only a pollution-reducing material generating no harmful substance, but can also be utilized as a coating material in various fields due to high adhesiveness. Furthermore, a polymeric film employing the polymer as a material has a volume resistance of about 5.8 × 1015 Ohmcm, showing an excellent resistance value as an insulating material.
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Inventors:
SOHN EUN-HO (KR)
KIM SEONWOO (KR)
SO WON WOOK (KR)
YOOK SHIN HONG (KR)
PARK IN JOON (KR)
CHANG BONG JUN (KR)
KANG HONG SUK (KR)
KIM JU HYEON (KR)
BAIK JI HOON (KR)
LEE SANG GOO (KR)
HAN DONG JE (KR)
HEO HYEON JUN (KR)
KIM SEONWOO (KR)
SO WON WOOK (KR)
YOOK SHIN HONG (KR)
PARK IN JOON (KR)
CHANG BONG JUN (KR)
KANG HONG SUK (KR)
KIM JU HYEON (KR)
BAIK JI HOON (KR)
LEE SANG GOO (KR)
HAN DONG JE (KR)
HEO HYEON JUN (KR)
Application Number:
PCT/KR2022/009579
Publication Date:
January 26, 2023
Filing Date:
July 04, 2022
Export Citation:
Assignee:
KOREA RES INST CHEMICAL TECH (KR)
International Classes:
C08F220/22; C08F220/06; C08F220/28; C08K5/29; C08L33/16; C09D5/16; C09D133/16
Foreign References:
| KR20190078484A | 2019-07-04 | |||
| KR20150065775A | 2015-06-15 | |||
| JP2013173840A | 2013-09-05 | |||
| JP2006063132A | 2006-03-09 | |||
| KR20170101626A | 2017-09-06 |
Attorney, Agent or Firm:
LEE, Won Hee (KR)
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